Cationic photosensitive formulations based on silyl radical chemistry for green and red diode laser exposure

Cationic photosensitive formulations based on silyl radical chemistry for green and red diode laser exposure

Mohamad-Ali Tehfe, Didier Gigmes, Frédéric Dumur, Denis Bertin, Fabrice Morlet-Savary, Bernadette Graff, Jacques Lalevée, Jean-Pierre Fouassier,
Polymer Chemistry, 3 1899-1902 (2012)